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Titanium nitride film deposition technology by multi-arc ion vacuum coating machine

2019-08-19 10:11  Times of view:

Multi-arc ion plating can obtain the best metal film layer, which has high metal ionization rate and high metal ion current density. It is coated with titanium nitride coating technology by multi-arc ion process and deposited by unbalanced magnetron sputtering source. Titanium nitride super hard coating. Each small arc spot is an electron emission source, a metal evaporation source, a metal ionization source, a high-density electron flow and a high-density collision of a vapor flow to generate a current, and a metal ion current with a high ionization rate can be obtained, and the plating layer is uniform. efficient.

At present, most of the multi-arc ion plating equipment adopts a small arc source with a diameter of about 100 mm. The whole coating machine has a plurality of small arc sources. Each small arc source is equipped with a power source, a pilot arc needle, and a control system. The structure is very Complex, the operator must always pay attention to the working conditions of each arc source.

Zunhua Baorui Titanium Equipment

vacuum coating machine,pvd coating machine,pvd vacuum machine,vacuum ion coating machine,multi-arc ion coating machine

Since multi-arc ion plating technology has become an important technology for depositing titanium nitride super-hard coating, much work has been done on its research and improvement.

#Multi-arc ion vacuum coating machine arc source

Zunhua Baorui Titanium Equipment

vacuum coating machine,pvd coating machine,pvd vacuum machine,vacuum ion coating machine,multi-arc ion coating machine

Rectangular plane large arc source multi-arc ion coating machine

The arc source control level of our large arc source multi-arc ion coating machine is better than that of American products, the target ablation is uniform and the target utilization rate is high. The large arc source of the rectangular plane is located on both sides of the vacuum coating machine, and the large arc source is installed on the wall of the coating chamber. Each coating machine can be installed with one or two large arc sources. Each coater is equipped with only one to two arc power supplies, one or two pilot pins and a control system. The device has a simple structure and easy operation. One of the above photos is a large arc source. The large arc source target is generally 120mm to 250mm in width and 300mm to 1500mm in length. The arc spot motion can be controlled by electromagnetic control or permanent magnet control.

Zunhua Baorui Titanium Equipment

vacuum coating machine,pvd coating machine,pvd vacuum machine,vacuum ion coating machine,multi-arc ion coating machine

columnar arc source multi-arc ion coating machine

The columnar arc source multi-arc ion coating machine developed by our company has a simple structure, and the permanent magnet rotates in the target tube. The generated arc spot can be straight or spiral, and is distributed along the entire length of the column arc source. After scanning along the target surface and igniting the arc discharge, the column arc source is continuously coated in a 360° direction along the entire length. A coating machine requires only one column arc source, one arc power source, one pilot pin, and one control system to achieve uniform coating along the entire length of the workpiece turret. Manipulation requires only one arcing maneuver, just care about the working conditions of an arc source. The device has simple structure, simple operation and low failure rate.

The columnar arc source is installed in the center of the coating chamber, as shown in 2 of the above figure. The cylindrical arc source target is tubular, straight 40mm~100mm, length 200mm~2000mm, and the columnar arc source is as long as the workpiece turret. A magnetic field is disposed inside or outside the target tube, which may be electromagnetic control or permanent magnet control, so that the arc spot moves on the target surface. The column arc source is equipped with a planar arc source or a planar magnetron source to facilitate the plating of the alloy film and the multilayer film.

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